Rf power deliveryAe ParamountAdvanced energy cesarCesar 1310AE Paramount 1513Paramount 3013 manualDressler RFParamount generatorPlasma Power Supply射頻電漿源 - Junsun Tech
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射頻電漿源RFPlasmaSource
在真空鍍膜的領域中，適當運用高密度電漿除了能獲得緻密的鍍膜品質外，也能在低溫狀態下完成鍍膜，避免高溫對於鍍膜品質產生不之良影響，因此如何獲致高密度之電漿是各家設備商極力開發之關鍵製程技術。
俊尚科技提供您德國CCRTechnology的COPRA電漿源，其特色如下：
能產生極大之離子電流密度
離子能量（IonEnergy）可獨立控制，不因RF電源的輸出大小而變化。
可針對特定製程
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