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射頻電漿源RF Plasma Source. ccr. 在真空鍍膜的領域中,適當運用高密度電漿除了能獲得緻密的鍍膜品質外,也 ...
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Most rf sources use the 13.56MHz industrial standard frequency. Among these, there are three main...
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A broad range of RF plasma generators and access unique features for configuration, control, and ...