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Effect of N2, Ar, and O2 plasma treatments on surface ...

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2. In the case of O2 plasma, an oxygen atom located ... Home > JournalofAppliedPhysics > Volume103,Issue7 > 10.1063/1.2874495 Prev Next NoAccess Submitted:04September2007 Accepted:20December2007 PublishedOnline:03April2008 JournalofAppliedPhysics103,076101(2008); https://doi.org/10.1063/1.2874495 SooYoungKim1,KihyonHong1,KisooKim1,HakKiYu1,Woong-KwonKim1,andJong-LamLee1,a)more...ViewAffiliations1DepartmentofMaterialsScienceandEngineering,PohangUniversityofScienceandTechnology(POSTECH),Pohang,Kyungbuk790-784,RepublicofKoreaa)Electronicmail:[email protected] PDF CHORUS Abstract FullText Figures Citedby Tools DownloadCitation AddtoFavorites ReprintsandPermissions E-mail Facebook Linkedin Twitter Reddit Mendeley RecommendtoLibrarian Share E-mail Facebook Linkedin Twitter Reddit Mendeley RecommendtoLibrarian metrics 3.2K Views Topics Topics Thinfilmtransistors Emissionspectroscopy Atomicforcemicroscopy Nanotubes Photoelectronspectroscopy Workfunctions Plasmaprocessing Chemicalbonding Plasmapropertiesandparameters Synchrotronradiation ABSTRACTWereporttheeffectofN2,Ar,andO2plasmatreatmentsonthesurfacepropertiesofmetals.ThecarbonatomsreducedmoreinO2andArplasmathaninN2plasmaduetoachemicalreactionwithO2plasmaandlargeplasmadensityinArplasma.Awatercontactangledecreasedaftertheplasmatreatmentregardlessofthekindsofplasmagas,showingtheincreaseinthehydrophilicityinsurfaces.SynchrotronradiationphotoemissionspectroscopydatashowedthattheworkfunctionincreasedafterN2,Ar,andO2plasmatreatmentsinsequence.ThisisduetothereductionofcarbonatomsandtheformationofO-richsurfaceinO2plasmacase.ThisresearchwassupportedinpartbyaGrant(F0004180-2007-23)fromtheInformationDisplayR&DCenter,oneofthe21stCenturyFrontierR&DProgramfundedbytheMinistryofCommerce,Industry,andEnergyoftheKoreanGovernment,andinpartbytheKoreanResearchFoundationGrantfundedbytheKoreanGovernment(MOEHRD)(KRF-2005-005-J13102).REFERENCESSection:ChooseTopofpageABSTRACTREFERENCES<

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