Inductively coupled plasma - Wikipedia

An inductively coupled plasma (ICP) or transformer coupled plasma (TCP) is a type of plasma source in which the energy is supplied by electric currents ... Inductivelycoupledplasma FromWikipedia,thefreeencyclopedia Jumptonavigation Jumptosearch Fig.1.PictureofananalyticalICPtorch Aninductivelycoupledplasma(ICP)ortransformercoupledplasma(TCP)[1]isatypeofplasmasourceinwhichtheenergyissuppliedbyelectriccurrentswhichareproducedbyelectromagneticinduction,thatis,bytime-varyingmagneticfields.[2] Contents 1Operation 2Applications 3Seealso 4References Operation[edit] Fig.2.TheconstructionofInductivelyCoupledPlasmatorch.[3]A:coolinggastangentialflowtotheouterquartztubeB:dischargegasflow(usuallyAr)C:flowofcarriergaswithsampleD:inductioncoilwhichformsthestrongmagneticfieldinsidethetorchE:forcevectorsofthemagneticfieldF:theplasmatorch(thedischarge). TherearethreetypesofICPgeometries:planar(Fig.3(a)),cylindrical[4](Fig.3(b)),andhalf-toroidal(Fig.3(c)).[5] Fig.3.ConventionalPlasmaInductors Inplanargeometry,theelectrodeisalengthofflatmetalwoundlikeaspiral(orcoil).Incylindricalgeometry,itislikeahelicalspring.Inhalf-toroidalgeometry,itistoroidalsolenoidcutalongitsmaindiametertotwoequalhalves. Whenatime-varyingelectriccurrentispassedthroughthecoil,itcreatesatime-varyingmagneticfieldaroundit,withflux Φ = π r 2 H = π r 2 H 0 cos ⁡ ω t {\displaystyle\Phi=\pir^{2}H=\pir^{2}H_{0}\cos\omegat} , whereristhedistancetothecenterofcoil(andofthequartztube). AccordingtotheFaraday–Lenz'slawofinduction,thiscreatesazimuthalelectromotiveforceintherarefiedgas: U = − d Φ d t {\displaystyleU=-{\frac{d\Phi}{dt}}} , whichcorrespondstoelectricfieldstrengthsof E = U 2 π r = ω r H 0 2 sin ⁡ ω t {\displaystyleE={\frac{U}{2\pir}}={\frac{\omegarH_{0}}{2}}\sin\omegat} ,[6] leadingtotheformationofthefigure-8electrontrajectories[5]providingaplasmageneration.Thedependenceonrsuggeststhatthegasionmotionismostintenseintheouterregionoftheflame,wherethetemperatureisthegreatest.Intherealtorch,theflameiscooledfromtheoutsidebythecoolinggas,sothehottestouterpartisatthermalequilibrium.Theretemperaturereaches5 000–6 000 K.[7]Formorerigorousdescription,seeHamilton–Jacobiequationinelectromagneticfields. ThefrequencyofalternatingcurrentusedintheRLCcircuitwhichcontainsthecoilusually27–41 MHz.Toinduceplasma,asparkisproducedattheelectrodesatthegasoutlet.Argonisoneexampleofacommonlyusedrarefiedgas.Thehightemperatureoftheplasmaallowsthedeterminationofmanyelements,andinaddition,forabout60elementsdegreeofionizationinthetorchexceeds90%.TheICPtorchconsumesca.1250–1550 Wofpower,butthisdependsontheelementalcompositionofthesample(duetodifferentionizationenergies).[7] TheICPshavetwooperationmodes,calledcapacitive(E)modewithlowplasmadensityandinductive(H)modewithhighplasmadensity,andEtoHheatingmodetransitionoccurswithexternalinputs.[8] Applications[edit] Plasmaelectrontemperaturescanrangebetween~6,000Kand~10,000K(~6eV-~100eV),[5]andareusuallyseveralordersofmagnitudegreaterthanthetemperatureoftheneutralspecies.ArgonICPplasmadischargetemperaturesaretypically~5,500to6,500K[9]andarethereforecomparabletothatreachedatthesurface(photosphere)ofthesun(~4,500Kto~6,000K).ICPdischargesareofrelativelyhighelectrondensity,ontheorderof1015cm−3.Asaresult,ICPdischargeshavewideapplicationswhereahigh-densityplasma(HDP)isneeded. ICP-AES,atypeofatomicemissionspectroscopy. ICP-MS,atypeofmassspectrometry. ICP-RIE,atypeofreactive-ionetching. AnotherbenefitofICPdischargesisthattheyarerelativelyfreeofcontamination,becausetheelectrodesarecompletelyoutsidethereactionchamber.Bycontrast,inacapacitivelycoupledplasma(CCP),theelectrodesareoftenplacedinsidethereactorandarethusexposedtotheplasmaandsubsequentreactivechemicalspecies. Seealso[edit] Pulsedinductivethruster Inductionplasmatechnology Listofplasmaphysicsarticles Capacitivelycoupledplasma References[edit] ^Highdensityfluorocarbonetchingofsiliconinaninductivelycoupledplasma:MechanismofetchingthroughathicksteadystatefluorocarbonlayerArchived2016-02-07attheWaybackMachineT.E.F.M.Standaert,M.Schaepkens,N.R.Rueger,P.G.M.Sebel,andG.S.Oehrleinc ^A.MontaserandD.W.Golightly,eds.(1992).InductivelyCoupledPlasmasinAnalyticalAtomicSpectrometry.VCHPublishers,Inc.,NewYork.CS1maint:extratext:authorslist(link) ^Lajunen,L.H.J.;Perämäki,P.(2004).SpectrochemicalAnalysisbyAtomicAbsorptionandEmission(2 ed.).Cambridge:RSCPublishing.p. 205.ISBN 978-0-85404-624-9. ^PascalChambertandNicholasBraithwaite(2011).PhysicsofRadio-FrequencyPlasmas.CambridgeUniversityPress,Cambridge.pp. 219–259.ISBN 978-0521-76300-4. ^abcShun'ko,EvgenyV.;Stevenson,DavidE.;Belkin,VeniaminS.(2014)."InductivelyCouplingPlasmaReactorWithPlasmaElectronEnergyControllableintheRangeFrom~6to~100eV".IEEETransactionsonPlasmaScience.42(3):774–785.Bibcode:2014ITPS...42..774S.doi:10.1109/TPS.2014.2299954.ISSN 0093-3813.S2CID 34765246. ^Бабушкин,А.А.;Бажулин,П.А.;Королёв,Ф.А.;Левшин,Л.В.;Прокофьев,В.К.;Стриганов,А.Р.(1962)."Эмиссионныйспектральныйанализ".InГольденберг,Г.С.(ed.).Методыспектральногоанализа.Москва:ИздательствоМГУ.p. 58. ^abDunnivant,F.M.;Ginsbach,J.W.(2017).FlameAtomicAbsorbanceandEmissionSpectrometryandInductivelyCoupledPlasma—MassSpectrometry.WhitmanCollege.Retrieved10January2018. ^Hyo-ChangLee(2018)Reviewofinductivelycoupledplasmas:Nano-applicationsandbistablehysteresisphysics5011108https://doi.org/10.1063/1.5012001 ^Cornelis,RITA;Nordberg,MONICA(2007)."CHAPTER2-GeneralChemistry,Sampling,AnalyticalMethods,andSpeciation**PartlybasedonChapter2:GeneralchemistryofmetalsbyV.VoukandChapter3:SamplingandanalyticalmethodsbyT.J.KneipandL.FriberginFribergetal.(1986).".HandbookontheToxicologyofMetals(Third ed.).AcademicPress.pp. 11–38.doi:10.1016/B978-012369413-3/50057-4.ISBN 9780123694133. 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